Manufacturing Engineering Intern
The Estée Lauder Companies Inc., Petersfield, Hampshire
Manufacturing Engineering Intern
Salary Not Specified
The Estée Lauder Companies Inc., Petersfield, Hampshire
- Full time
- U
- Onsite working
- Graduate programme
Posted 5 days ago, 1 Jan | Get your application in now to be included in the first week's applications.
Closing date: Closing date not specified
job Ref: 31059ae91d99420182e8c592b23ef354
Full Job Description
Estée Lauder Companies are recruiting for a Manufacturing Engineering Intern (CVE) within the Commercialisation and Validation Engineering department for a 13-month placement at Whitman Laboratories. This site produces around one-fifth of Estée Lauder's global sales output. The role is based in a fast-paced manufacturing environment within the CVE team, supporting the launch of new products and components on production lines. This includes preparing for and monitoring new product implementations through risk assessments, production studies, and investigating issues with data analysis. WHAT YOU'LL BE DOING:
- Undertake production studies to monitor and optimise assembly area effectiveness, enhancing continuous improvement initiatives. Provide recommendations and discuss ideas with management.
- Support line improvement and strategic projects by collaborating with managers, working within a team or independently as required.
- Assist the CVE team with line trials and maintain necessary documentation.
- Compile performance and operations data into usable formats to identify trends and areas for improvement.
- Develop cost-saving initiatives, assess their feasibility, and drive implementation of viable improvements.
Studying an Undergraduate Degree in Engineering or related subject and be on track to achieving a 2:1 standard or higher. (A Chemical, industrial or mechanical engineering degree is preferred). QUALITIES: We are looking for excellent team workers, good communicators, strong project management and organisational skills, outgoing and persuasive individuals.